A micromachined thin-film gas flow sensor for microchemical reactors

As microchemical systems (MCS) have gained in importance since their introduction in the last decade, it has become recognized that appropriate sensing and control capabilities are needed if MCS are to reach their potential. In this context, we present a study of the working behavior of a novel thin-film micro flow sensor which is integrated with a silicon microreactor with a submillimeter channel. A simple-to-fabricate device based on the concept of calorimetric sensing was chosen as a model structure to understand the important factors controlling sensor performance. Various design options for the sensor were explored by the use of computational fluid dynamics simulations. We found that sensitivity depends strongly on certain design factors. In summary, sensitivity is improved with (a) higher values of the resistors that detect flow-induced temperature changes, (b) shorter distances between the resistor that provides a source of heat and the thermally sensitive resistors and (c) higher input power to the heating resistor. Item (a) was found to have by far the strongest effect of the three. Reproducibility tests were conducted and the sensor exhibited consistent performance throughout the entire test range of 0–20 sccm which is an appropriate fit to the flow capacity of the microchannel. Finally, response time was assessed by simulating the transient behavior of the sensor with a thermal capacitance model, which yielded an accurate prediction of the experimental response of the device. The response time is approximately 70 ms at a typical flow rate of 10 sccm. According to the understanding gained from the model, the sensor response time can be improved by reducing the substrate thickness, using a lower density substrate material, and increasing the convective heat transfer coefficient in the channel.