论文信息 - Cl2-based inductively coupled plasma etching of CoFeB, CoSm, CoZr and FeMn - 字舞流文

Cl2-based inductively coupled plasma etching of CoFeB, CoSm, CoZr and FeMn

S. Pearton | J. Childress | Y. Hahn | K. B. Jung | D. Hays | T. Feng | Hyun Cho | Y. Park