Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns

The continual scaling down of complementary metal–oxide semiconductor feature size to 100 nm and below necessitates a characterization technique to resolve high-aspect-ratio features in the nanoscale regime. We report the use of atomic force microscopy coupled with high-aspect-ratio multiwalled carbon nanotube (MWCNT) scanning probe tip for the purpose of imaging surface profile of photoresists. MWCNT tips of 5–10 nm in diameter and about a micron long are used. Their exceptional mechanical strength and ability to buckle reversibly enable resolution of steep, deep nanoscale features. Images of photoresist patterns generated by 257 nm interference lithography as well as 193 nm lithography are presented to demonstrate MWCNT scanning probe tips for applications in metrology.

[1]  A. Hoffman,et al.  Atomic force microscope study of amorphous silicon and polysilicon low-pressure chemical-vapor-deposited implanted layers , 2000 .

[2]  H. Dai,et al.  Nanotubes as nanoprobes in scanning probe microscopy , 1996, Nature.

[3]  Martha I. Sanchez,et al.  Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance , 1998 .

[4]  Charles M. Lieber,et al.  High-yield assembly of individual single-walled carbon nanotube tips for scanning probe microscopies , 2001 .

[5]  Yale E. Strausser,et al.  Characterization of the low-pressure chemical vapor deposition grown rugged polysilicon surface using atomic force microscopy , 1997 .

[6]  M. Meyyappan,et al.  Improved fabrication approach for carbon nanotube probe devices , 2000 .

[7]  M. Meyyappan,et al.  Combinatorial Optimization of Heterogeneous Catalysts Used in the Growth of Carbon Nanotubes , 2001 .

[8]  Bin Chen,et al.  Multilayered metal catalysts for controlling the density of single-walled carbon nanotube growth , 2001 .

[9]  M. Meyyappan,et al.  Carbon nanotube tip probes: stability and lateral resolution in scanning probe microscopy and application to surface science in semiconductors , 2001 .

[10]  W. L. Wu,et al.  Microroughness of polymer thin films studied by total-reflection x-ray fluorescence and atomic force microscopy , 1998 .

[11]  Munirathna Padmanaban,et al.  CD changes of 193-nm resists during SEM measurement , 2001, SPIE Advanced Lithography.

[12]  Peter T. Lansbury,et al.  Carbon Nanotube Tips: High-Resolution Probes for Imaging Biological Systems , 1998 .

[13]  E. Snow,et al.  Single-wall carbon nanotube atomic force microscope probes , 2002 .