Fabrication of Free Space Micro Optical Elements

A new three dimensional integrated optical system, termed free space micro optical bench (FS MOB), is described. We developed a new technique, which used the silica (SiO 2) as the optical material , photoresist and the spattered copper (Cu) thin film as the sacrificial layers, and the elecroplated ferronickel (FeNi) as the structure layer, to fabricate the free space micro optical elements. This technique offers a new approach to fabricate high quality phase micro optical elements for free space integrated micro optics and other applications. is described. We developed a new technique, which used the silica (SiO 2) as the optical material , photoresist and the spattered copper (Cu) thin film as the sacrificial layers, and the elecroplated ferronickel (FeNi) as the structure layer, to fabricate the free space micro optical elements. This technique offers a new approach to fabricate high quality phase micro optical elements for free space integrated micro optics and other applications.