论文信息 - Low bias dry etching of III-nitrides in Cl2-based inductively coupled plasmas - 字舞流文

Low bias dry etching of III-nitrides in Cl2-based inductively coupled plasmas

S. Pearton | C. Abernathy | C. Vartuli | J. Mackenzie | R. Shul | H. Cho | C. Constantine | S. Donovan | J. MacKenzie | Hyun Cho