Effect of initial resist thickness on residual layer thickness of nanoimprinted structures
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Wen-li Wu | Eric K. Lin | Christopher L. Soles | Hyun Wook Ro | Daniel R. Hines | Ronald L. Jones | C. Soles | Wen-Li Wu | E. Lin | D. Hines | Ronald Jones | H. Ro | Hae-Jeong Lee | Hae-Jeong Lee
[1] Wen-li Wu,et al. Structural characterization of porous low-k thin films prepared by different techniques using x-ray porosimetry , 2004 .
[2] Olivier Joubert,et al. Influence of pattern density in nanoimprint lithography , 2003 .
[3] C. Gourgon,et al. Influence of Thermal Properties of Polymers on NanoImprint Lithography Performance , 2001, Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468).
[4] Stephen Y. Chou,et al. Imprint lithography with sub-10 nm feature size and high throughput , 1997 .
[5] Demirel,et al. Glasslike Transition of a Confined Simple Fluid. , 1996, Physical review letters.
[6] S. Granick,et al. Motions and Relaxations of Confined Liquids , 1991, Science.
[7] J. Israelachvili,et al. Molecular organization and viscosity of a thin film of molten polymer between two surfaces as probed by force measurements , 1988 .
[8] L. G. Parratt. Surface Studies of Solids by Total Reflection of X-Rays , 1954 .