Examination of flatband and threshold voltage tuning of HfO2∕TiN field effect transistors by dielectric cap layers
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V. Narayanan | B. Linder | M. Copel | N. Bojarczuk | S. Guha | V. Paruchuri | B. Doris | P. Batson | Yanfeng Wang
暂无分享,去创建一个
V. Narayanan | B. Linder | M. Copel | N. Bojarczuk | S. Guha | V. Paruchuri | B. Doris | P. Batson | Yanfeng Wang