论文信息 - Selective etching of SiO2 over polycrystalline silicon using CHF3 in an inductively coupled plasma reactor - 字舞流文

Selective etching of SiO2 over polycrystalline silicon using CHF3 in an inductively coupled plasma reactor

N. R. Rueger | Marcus F. Doemling | Neal R. Rueger | T. Standaert | G. Oehrlein | M. Schaepkens | J. Beulens