Method for detecting semiconductor device

The invention provides a method for detecting a semiconductor device, comprising the following steps of: providing a standard optical mask, wherein the standard optical mask comprises photoetching information; obtaining coordinate information of a wafer detecting region in the photoetching information; converting the coordinate information into an SEM (scanning electron microscope) readable coordinate information; building a measuring pattern template, wherein the measuring pattern template comprises a standard detecting region pattern; orderly placing the wafers of the patterned photoetching layer which are defined by the standard photoetching mask in the SEM, finding out the wafer detecting region according to the SEM coordinate information; comparing the wafer detecting region patterns with the standard detecting region patterns of the measuring pattern template, wherein if the wafer detecting region patterns are consistent with the standard detecting region patterns, the detecting position is right; if the wafer detecting region patterns are not consistent with the standard detecting region patterns, the detection position is deviated. The detection method in the invention greatly reduces the detection time of occupying the SEM machines on the production line, greatly increases the detection efficiency of the wafer, and is beneficial for improving the work efficiency.