Modeling effects of oxygen inhibition in mask‐based stereolithography

Purpose – The purpose of this paper is to present a model that can be used to simulate the photopolymerization process in micro‐stereolithography (SL) in order to predict the shape of the cured parts. SL is an additive manufacturing process in which liquid photopolymer resin is cross‐linked and converted to solid with a UV laser light source. Traditional models of SL processes do not consider the complex chemical reactions and species transport occurring during photopolymerization and, hence, are incapable of accurately predicting resin curing behavior. The model presented in this paper attempts to bridge this knowledge gap.Design/methodology/approach – The chemical reactions involved in the photopolymerization of acrylate‐based monomers were modeled as ordinary differential equations (ODE). This model incorporated the effect of oxygen inhibition and diffusion on the polymerization reaction. The model was simulated in COMSOL and verified with experiments conducted on a mask‐based micro‐SL system. Parametr...

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