Highly-conformal p-type copper(I) oxide (Cu2O) thin films by atomic layer deposition using a fluorine-free amino-alkoxide precursor
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Soo‐Hyun Kim | Hyungjun Kim | Jin-Ha Hwang | Min Young Lee | S. Bae | K. Ko | Hangil Kim | Do‐Joong Lee | Kyeong-Woo Kwon