Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition

[1]  W. Keuning,et al.  Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films , 2009, ECS Transactions.

[2]  Jizhou Kong,et al.  Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition , 2017, Nanoscale Research Letters.

[3]  James S. Daubert,et al.  Corrosion Protection of Copper Using Al2O3, TiO2, ZnO, HfO2, and ZrO2 Atomic Layer Deposition. , 2017, ACS applied materials & interfaces.

[4]  M. Ritala,et al.  Corrosion protection of aluminium by ultra-thin atomic layer deposited alumina coatings , 2016 .

[5]  Bo Bao,et al.  Chemical Stability of Titania and Alumina Thin Films Formed by Atomic Layer Deposition. , 2015, ACS applied materials & interfaces.

[6]  Aidong Li,et al.  Improved thermal stability and electrical properties of atomic layer deposited HfO2/AlN high-k gate dielectric stacks on GaAs , 2015 .

[7]  Matthew R. Shaner,et al.  Amorphous TiO2 coatings stabilize Si, GaAs, and GaP photoanodes for efficient water oxidation , 2014, Science.

[8]  Yong Jin Jeong,et al.  Al2O3/TiO2 nanolaminate thin film encapsulation for organic thin film transistors via plasma-enhanced atomic layer deposition. , 2014, ACS applied materials & interfaces.

[9]  Se Stephen Potts,et al.  Hydrogen–argon plasma pre-treatment for improving the anti-corrosion properties of thin Al2O3 films deposited using atomic layer deposition on steel , 2013 .

[10]  N. Lewis,et al.  Photoelectrochemical Behavior of n‑type Si(100) Electrodes Coated with Thin Films of Manganese Oxide Grown by Atomic Layer Deposition , 2013 .

[11]  Mikko Ritala,et al.  Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends , 2013 .

[12]  Liuying Huang,et al.  HfxZr1−xO2 films chemical vapor deposited from a single source precursor of anhydrous HfxZr1−x(NO3)4 , 2012 .

[13]  Y. C. Lee,et al.  Al2O3 and TiO2 atomic layer deposition on copper for water corrosion resistance. , 2011, ACS applied materials & interfaces.

[14]  Se Stephen Potts,et al.  Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges , 2011 .

[15]  Hyungjun Kim,et al.  Characteristics and applications of plasma enhanced-atomic layer deposition , 2011 .

[16]  Yohan Park,et al.  Atomic layer-deposited tunnel oxide stabilizes silicon photoanodes for water oxidation. , 2011, Nature materials.

[17]  M. Ritala,et al.  Low-temperature atomic layer deposition of Al2O3 thin coatings for corrosion protection of steel: Surface and electrochemical analysis , 2011 .

[18]  Se Stephen Potts,et al.  Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection , 2011 .

[19]  A. Lanzutti,et al.  Corrosion protection of AISI 316 stainless steel by ALD alumina/titania nanometric coatings , 2011 .

[20]  S. George.  Atomic layer deposition: an overview. , 2010, Chemical reviews.

[21]  Mikko Heikkilä,et al.  Atomic Layer Deposition of High‐k Oxides of the Group 4 Metals for Memory Applications , 2009 .

[22]  C. Shan,et al.  Corrosion resistance of TiO2 films grown on stainless steel by atomic layer deposition , 2008 .

[23]  P. Mahadevan,et al.  An overview , 2007, Journal of Biosciences.

[24]  Do‐Heyoung Kim,et al.  Characteristics of TiOx films prepared by chemical vapor deposition using tetrakis-dimethyl-amido-titanium and water , 2006 .

[25]  S. Yun,et al.  Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition , 2005 .

[26]  S. Yun,et al.  Characteristics of TiO2 Films Prepared by ALD With and Without Plasma , 2004 .

[27]  Jaan Aarik,et al.  Phase transformations in hafnium dioxide thin films grown by atomic layer deposition at high temperatures , 2001 .

[28]  R. Wallace,et al.  Hafnium and zirconium silicates for advanced gate dielectrics , 2000 .

[29]  W. Epling,et al.  Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100) , 1999 .

[30]  Olof Forsén,et al.  Atomic layer deposited thin films for corrosion protection , 1999 .

[31]  Jeffrey T. Roberts,et al.  Low Temperature CVD of Crystalline Titanium Dioxide Films Using Tetranitratotitanium(IV , 1998 .