Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control

Introduction * Substrate ("Real") Surfaces and Surface Modification * The Low-Pressure Gas and Vacuum Processing Environment * The Low-Pressure Plasma Processing Environment * Vacuum Evaporation and Vacuum Deposition * Physical Sputtering and Sputter Deposition (Sputtering) * Arc Vapor Deposition * Ion Plating and Ion Beam Assisted Deposition * Atomistic Film Growth and Some Growth-Related Film Properties * Film Characterization and some Basic Film Properties * Adhesion and Deadhesion * Cleaning * External Processing Environment. Appendix 1: Reference Material. Appendix 2: Transfer of Technology for R&D to Manufacturing. Glossary of Terms and Acronyms used in Surface Engineering. Index.