Characteristics of nanocrystalline AlN:Er films co-deposited by using AlN, Er, and SiO2 targets
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S. Ji | K. Mimura | M. Isshiki | J. Yoo | Jaewon Lim | J. F. Wang | Y. Zhu | J. Bae | W. Takayama
暂无分享,去创建一个
S. Ji | K. Mimura | M. Isshiki | J. Yoo | Jaewon Lim | J. F. Wang | Y. Zhu | J. Bae | W. Takayama