Textured p-type crystalline silicon surfaces obtained by multi-step plasma process for SHJ solar cells

[1]  J. Veirman,et al.  Closing the gap between n‐ and p‐type silicon heterojunction solar cells: 24.47% efficiency on lightly doped Ga wafers , 2022, Progress in Photovoltaics: Research and Applications.

[2]  J. Kovač,et al.  Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF4/H2 Plasma Reactive-Ion Etching , 2022, ACS omega.

[3]  Chunlan Zhou,et al.  Improvement of the Surface Structure for the Surface Passivation of Black Silicon , 2020, IEEE Journal of Photovoltaics.

[4]  M. Wright,et al.  The Technical and Economic Viability of Replacing n-type with p-type Wafers for Silicon Heterojunction Solar Cells , 2020, Cell Reports Physical Science.

[5]  M. Zeman,et al.  Effective Passivation of Black Silicon Surfaces via Plasma‐Enhanced Chemical Vapor Deposition Grown Conformal Hydrogenated Amorphous Silicon Layer , 2019, physica status solidi (RRL) – Rapid Research Letters.

[6]  K. Matsubara,et al.  Formation of electronic defects in crystalline silicon during hydrogen plasma treatment , 2019, AIP Advances.

[7]  M. Addonizio,et al.  Plasma etched c-Si wafer with proper pyramid-like nanostructures for photovoltaic applications , 2019, Applied Surface Science.

[8]  M. Zeman,et al.  Surface passivation of n-type doped black silicon by atomic-layer-deposited SiO2/Al2O3 stacks , 2017 .

[9]  K. Sopian,et al.  Research and development efforts on texturization to reduce the optical losses at front surface of silicon solar cell , 2016 .

[10]  P. Cabarrocas,et al.  Towards 12% stabilised efficiency in single junction polymorphous silicon solar cells: experimental developments and model predictions , 2016 .

[11]  P. Cabarrocas,et al.  Plasma-Texturing Processes and a-Si:H Surface Passivation on c-Si Wafers for Photovoltaic Applications , 2015 .

[12]  Hele Savin,et al.  Black silicon solar cells with interdigitated back-contacts achieve 22.1% efficiency. , 2015, Nature nanotechnology.

[13]  Wei Yan,et al.  Influence of Surface Morphology on the Effective Lifetime and Performance of Silicon Heterojunction Solar Cell , 2015 .

[14]  A. Tünnermann,et al.  The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching , 2014 .

[15]  Michael Algasinger,et al.  Amorphous/crystalline silicon heterojunction solar cells with black silicon texture , 2014 .

[16]  B. Hoex,et al.  Black silicon: fabrication methods, properties and solar energy applications , 2014 .

[17]  P. Petrik,et al.  Ellipsometric study of crystalline silicon hydrogenated by plasma immersion ion implantation , 2013 .

[18]  Chun Li,et al.  Role of boundary layer diffusion in vapor deposition growth of chalcogenide nanosheets: the case of GeS. , 2012, ACS nano.

[19]  S. Fernández,et al.  High quality textured ZnO:Al surfaces obtained by a two-step wet-chemical etching method for applications in thin film silicon solar cells , 2011 .

[20]  J. Pezoldt,et al.  Black luminescent silicon , 2011 .

[21]  J. Roots,et al.  Plasma etching of polydimethylsiloxane: Effects from process gas composition and dc self-bias voltage , 2011 .

[22]  Ralf Preu,et al.  Dry plasma processing for industrial crystalline silicon solar cell production , 2010 .

[23]  P. Cabarrocas,et al.  Plasma texturing for silicon solar cells: From pyramids to inverted pyramids-like structures , 2010 .

[24]  Chao-Kuei Lee,et al.  A simple and cost-effective approach for fabricating pyramids on crystalline silicon wafers , 2009 .

[25]  L. Korte,et al.  Passivation of textured substrates for a-Si:H/c-Si hetero-junction solar cells: Effect of wet-chemical smoothing and intrinsic a-Si:H interlayer , 2009 .

[26]  Young Kuk Kim,et al.  RIE texturing optimization for thin c-Si solar cells in SF6/O2 plasma , 2008 .

[27]  Remi Dussart,et al.  SiOxFy passivation layer in silicon cryoetching , 2005 .

[28]  Remi Dussart,et al.  Silicon columnar microstructures induced by an SF6/O2 plasma , 2005 .

[29]  Rita Rizzoli,et al.  An optimized texturing process for silicon solar cell substrates using TMAH , 2005 .

[30]  O. Ambacher,et al.  In situ spectroscopic ellipsometry of hydrogen-argon plasma cleaned silicon surfaces , 2004 .

[31]  M. Alkaisi,et al.  Damage studies in dry etched textured silicon surfaces , 2004 .

[32]  J. M. Kim,et al.  The enhancement of homogeneity in the textured structure of silicon crystal by using ultrasonic wave in the caustic etching process , 2004 .

[33]  Cheng-Hsien Tsai,et al.  Decomposition of SF6 in an RF Plasma Environment , 2002, Journal of the Air & Waste Management Association.

[34]  J. Gee,et al.  Characterization of random reactive ion etched-textured silicon solar cells , 2001 .

[35]  G. Arbilla,et al.  Kinetic analysis of the chemical processes in the decomposition of gaseous dielectrics by a non-equilibrium plasma - part 1: CF4 and CF4/O2 , 2000 .

[36]  R. Lüdemann,et al.  Low damage reactive ion etching for photovoltaic applications , 1999 .

[37]  R. Einhaus,et al.  Improved anisotropic etching process for industrial texturing of silicon solar cells , 1999 .

[38]  Marc Schaepkens,et al.  High density fluorocarbon etching of silicon in an inductively coupled plasma: Mechanism of etching through a thick steady state fluorocarbon layer , 1998 .

[39]  Michael Curt Elwenspoek,et al.  The black silicon method. VIII. A study of the performance of etching silicon using SF6/O2-based chemistry with cryogenical wafer cooling and a high density ICP source , 1997 .

[40]  J. Piqueras,et al.  Passivation, structural modification, and etching of amorphous silicon in hydrogen plasmas , 1997 .

[41]  Miko Elwenspoek,et al.  The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control , 1995 .

[42]  T. Yamabe,et al.  Silicon etching reaction by fluorine : local chemical model of n-Doping effects , 1991 .

[43]  T. Yamabe,et al.  Chemical mechanism for p-doping effects on silicon etching reaction by fluorine , 1991 .

[44]  A. Roosmalen,et al.  Review: dry etching of silicon oxide , 1984 .

[45]  H. F. Winters,et al.  Plasma etching—A discussion of mechanisms , 1979 .

[46]  E. Irene,et al.  Silicon Oxidation Studies: The Oxidation of Heavily B‐ and P‐Doped Single Crystal Silicon , 1978 .

[47]  W. E. Spicer,et al.  Electronic Structure of Amorphous Si from Photoemission and Optical Studies , 1972 .

[48]  A. Boisen,et al.  Black silicon laser-doped selective emitter solar cell with 18.1% efficiency , 2016 .

[49]  Maria Losurdo,et al.  Surface Texturing of n- and p-Doped c-Si Using a Novel Plasma Chemical Texturing Process , 2011 .

[50]  G. Morell,et al.  In situ spectroscopic ellipsometry study of the oxide etching and surface damaging processes on silicon under hydrogen plasma , 1999 .