论文信息 - Passive electrical vernier for measuring mask misalignment

Passive electrical vernier for measuring mask misalignment

A passive electrical vernier for the measurement of the misalignment between the layers of integrated circuits is presented. This three layer structure has the same simplicity of processing as analogue structures along with the advantages of digital measurement which make it an attractive alternative for measuring the mask misalignment between layers.

J. Walton | R. J. Holwill | M. Fallon | D. Ward | W. Gammie

[1] Anthony J. Walton,et al. Digital measurement of polysilicon to diffusion misalignment for a silicon gate MOS process , 1984 .

[2] D.S. Perloff. A four-point electrical measurement technique for characterizing mask superposition errors on semiconductor wafers , 1978, IEEE Journal of Solid-State Circuits.

[3] K. Harada,et al. Integrated electrical vernier to measure registration accuracy , 1986, IEEE Electron Device Letters.