论文信息 - Cl{sub 2}-based dry etching of the AlGaInN system in inductively coupled plasmas - 字舞流文

Cl{sub 2}-based dry etching of the AlGaInN system in inductively coupled plasmas

S. Pearton | J. Han | C. Abernathy | C. Vartuli | R. Shul | S. Donovan | Hyun Cho