Influence of crystallographic orientation of Sn-Ag-Cu on electromigration in flip-chip joint

[1]  K. Suganuma,et al.  Effects of the crystallographic orientation of Sn on the electromigration of Cu/Sn-Ag-Cu/Cu ball joints , 2011 .

[2]  K. Suganuma,et al.  Effects of the crystallographic orientation of Sn grain during electromigration test , 2010, 2010 IEEE CPMT Symposium Japan.

[3]  Y. C. Chan,et al.  Failure mechanisms of solder interconnects under current stressing in advanced electronic packages , 2010 .

[4]  C. Y. Liu,et al.  Electromigration-induced failures at Cu/Sn/Cu flip-chip joint interfaces , 2009, 2009 11th Electronics Packaging Technology Conference.

[5]  K. Yamanaka,et al.  Effect of underfill on electromigration lifetime in flip chip joints , 2009 .

[6]  Yi-Shao Lai,et al.  Electromigration on void formation of Sn3Ag1.5Cu FCBGA solder joints , 2009, Microelectron. Reliab..

[7]  Arun S. Mujumdar,et al.  Interface thermal characteristics of flip chip packages : A numerical study , 2009 .

[8]  Yin-Po Hung,et al.  Influence of underfill materials on the reliability of coreless flip chip package , 2008, Microelectron. Reliab..

[9]  Y. Lai,et al.  Orientation transformation of Pb grains in 5Sn–95Pb/ 63Sn–37Pb composite flip-chip solder joints during electromigration test , 2008 .

[10]  Paul A. Lauro,et al.  Effect of Sn grain orientation on electromigration degradation mechanism in high Sn-based Pb-free solders , 2008 .

[11]  B. Nandagopal,et al.  Influence of Sn Grain Size and Orientation on the Thermomechanical Response and Reliability of Pb-free Solder Joints , 2008, IEEE Transactions on Components and Packaging Technologies.

[12]  A. Wu,et al.  Direct observation and kinetic analysis of grain rotation in anisotropic tin under electromigration , 2008 .

[13]  Kimihiro Yamanaka,et al.  Studies on solder bump electromigration in Cu/Sn-3Ag-0.5Cu/Cu system , 2007, Microelectron. Reliab..

[14]  Jue Li,et al.  Evolution of microstructure and failure mechanism of lead-free solder interconnections in power cycling and thermal shock tests , 2007, Microelectron. Reliab..

[15]  Chih Chen,et al.  Investigation of void nucleation and propagation during electromigration of flip-chip solder joints using x-ray microscopy , 2006 .

[16]  F. Hua,et al.  Electromigration in flip chip solder joints having a thick Cu column bump and a shallow solder interconnect , 2006 .

[17]  Y. C. Chuang,et al.  Study of electromigration-induced Cu consumption in the flip-chip Sn∕Cu solder bumps , 2006 .

[18]  S. W. Liang,et al.  Study of void formation due to electromigration in flip-chip solder joints using Kelvin bump probes , 2006 .

[19]  B. Ebersberger,et al.  Reliability of lead-free SnAg solder bumps: influence of electromigration and temperature , 2005, Proceedings Electronic Components and Technology, 2005. ECTC '05..

[20]  K. Tu,et al.  Electromigration-induced grain rotation in anisotropic conducting beta tin , 2005 .

[21]  King-Ning Tu,et al.  Polarity effect of electromigration on kinetics of intermetallic compound formation in Pb-free solder V-groove samples , 2005 .

[22]  K. N. Subramanian,et al.  Grain-boundary character and grain growth in bulk tin and bulk lead-free solder alloys , 2004 .

[23]  Peter Borgesen,et al.  Growth of Sn and intermetallic compounds in Sn-Ag-Cu solder , 2004 .

[24]  Xiang Dai,et al.  Reliability issues for flip-chip packages , 2004, Microelectron. Reliab..

[25]  Jae-Woong Nah,et al.  Electromigration in flip chip solder bump of 97Pb-3Sn/37Pb-63Sn combination structure , 2004 .

[26]  J. O. Suh,et al.  Mechanism of electromigration-induced failure in the 97Pb-3Sn and 37Pb-63Sn composite solder joints , 2003 .

[27]  J. Lloyd Electromigration induced resistance decrease in Sn conductors , 2003 .

[28]  King-Ning Tu,et al.  Mean-time-to-failure study of flip chip solder joints on Cu/Ni(V)/Al thin-film under-bump-metallization , 2003 .

[29]  Katsuaki Suganuma,et al.  Effects of intermetallic compounds on properties of Sn–Ag–Cu lead-free soldered joints , 2003 .

[30]  King-Ning Tu,et al.  Physics and materials challenges for lead-free solders , 2003 .

[31]  King-Ning Tu,et al.  Current-crowding-induced electromigration failure in flip chip solder joints , 2002 .

[32]  D. R. Frear,et al.  Electromigration of eutectic SnPb and SnAg3.8Cu0.7 flip chip solder bumps and under-bump metallization , 2001 .

[33]  D. C. Yeh,et al.  Extreme Fast-Diffusion System: Nickel in Single-Crystal Tin , 1984 .

[34]  F. Huang Diffusion of Sb^ , Cd^ , Sn^ , and Zn^ in Tin , 1974 .

[35]  David Turnbull,et al.  Interstitial Diffusion of Copper in Tin , 1967 .

[36]  B. Dyson Diffusion of Gold and Silver in Tin Single Crystals , 1966 .

[37]  K. Suganuma,et al.  Effects of crystallographic orientation of Sn on electromigration behavior , 2010 .

[38]  K. Tu Recent advances on electromigration in very-large-scale-integration of interconnects , 2003 .

[39]  J. H. Lau,et al.  Effects of underfill delamination and chip size on the reliability of solder bumped Flip Chip on board , 1999 .