HfO2-based ferroelectrics: From enhancing performance, material design, to applications
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Dou Zhang | Hang Luo | C. Bowen | Xi Yuan | Haiyan Chen | Yonghong Chen | Xuefan Zhou | L. Tang
暂无分享,去创建一个
Dou Zhang | Hang Luo | C. Bowen | Xi Yuan | Haiyan Chen | Yonghong Chen | Xuefan Zhou | L. Tang