Three-dimensional Electrochemical Micromachining on Metal and Semiconductor by Confined Etchant Layer Technique (CELT)

The authors developed a technology for three dimensional (3D) electrochemical micromachining. The confined etchant layer technique (CELT) has been applied to achieve effective three-dimensional (3D) micromachining on different kinds of metals and semiconductors. This technique operates on the basis of indirect electrochemical process, and is a low-cost technique for microfabrication of arbitrary 3D structures in a single step.

[1]  Zhaoxiong Xie,et al.  Spatially confined copper dissolution by an STM tip: a new type of electrochemical reaction? , 2000 .

[2]  Patrik Hoffmann,et al.  Applications of laser lithography on oxide film to titanium micromachining , 2003 .

[3]  A. Bard,et al.  Hole Injection and Etching Studies of GaAs Using the Scanning Electrochemical Microscope , 1990 .

[4]  S. Meltzer,et al.  Study of silicon etching in HBr solutions using a scanning electrochemical microscope , 1995 .

[5]  A. Bard,et al.  High Resolution Etching of Semiconductors by the Feedback Mode of the Scanning Electrochemical Microscope , 1990 .

[6]  T. Will,et al.  Nanofabrication of Small Copper Clusters on Gold(111) Electrodes by a Scanning Tunneling Microscope , 1997, Science.

[7]  A. Bard,et al.  Scanning Electrochemical Microscopy: The Application of the Feedback Mode for High Resolution Copper Etching , 1989 .

[8]  Li Zhang,et al.  A preliminary study on chemical micro-machining of complex three-dimensional patterns on silicon substrates , 2005 .

[9]  Jin Luo,et al.  Three-dimensional micromachining for microsystems by confined etchant layer technique , 2001 .

[10]  Zhong-Qun Tian,et al.  Confined etchant layer technique for two-dimensional lithography at high resolution using electrochemical scanning tunnelling microscopy , 1992 .

[11]  D. Landolt,et al.  Electrochemical micromachining, polishing and surface structuring of metals: fundamental aspects and new developments , 2003 .

[12]  D. Landolt,et al.  Scale-Resolved Electrochemical Surface Structuring of Titanium for Biological Applications , 2003 .

[13]  Li Zhang,et al.  Three-dimensional micro-fabrication on copper and nickel , 2005 .

[14]  Zhao-Wu Tian,et al.  Studies on silicon etching using the confined etchant layer technique , 1998 .

[15]  P. Allongue,et al.  Electrochemical micromachining of p-type silicon , 2004 .