Open Cell Library in 15nm FreePDK Technology

This paper presents the 15nm FinFET-based Open Cell Library (OCL) and describes the challenges in the methodology while designing a standard cell library for such advanced technology node. The 15nm OCL is based on a generic predictive state-of-the-art technology node. The proposed cell library is intended to provide access to advanced technology node for universities and other research institutions, in order to design digital integrated circuits and also to develop cell-based design flows, EDA tools and associated algorithms. Developing a 15nm standard cell library brings out design challenges which are not present in previous technology nodes. Some of these challenges include double-patterning for both metal and poly layers, a very restrictive set of physical design rules, and the demand for lithography-friendly patterns. This paper discusses the development of the library considering the challenges associated with advanced technology nodes.

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