Tetragonal Phase Stabilization by Doping as an Enabler of Thermally Stable HfO2 based MIM and MIS Capacitors for sub 50nm Deep Trench DRAM
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P. Kirsch | S. Kudelka | J. Heitmann | A. Avellan | W. Krautschneider | T. Boscke | U. Schroder | R. Jammy | B. Lee | B. Gnade | C. Krug | P. Hung | S. Song | J. Price | B. Ju | S. Govindarajan | C. Fachmann | G. Pant | S.C. Song | B. Lee | B. Lee