IC failure analysis: techniques and tools for quality and reliability improvement
暂无分享,去创建一个
[1] J. M. Soden,et al. ICFAX, an integrated circuit failure analysis expert system , 1991, 29th Annual Proceedings Reliability Physics 1991.
[2] Ed Doyle,et al. Failure analysis techniques : a procedural guide , 1981 .
[3] G. Binnig,et al. Tunneling through a controllable vacuum gap , 1982 .
[4] J. Y. Lee,et al. A Review of Recent Developments in Focused Ion Beam Applications , 1984, 1984 Symposium on VLSI Technology. Digest of Technical Papers.
[5] Weiwei Mao,et al. Quietest: A methodology for selecting IDDQ test vectors , 1992, J. Electron. Test..
[6] J. M. Soden,et al. Light emission microscopy , 1992 .
[7] Y.A. Tkachenko,et al. High-voltage electron-beam-induced-current imaging of microdefects in laser diodes and MESFETs , 1994, Proceedings of 1994 IEEE International Reliability Physics Symposium.
[8] H. K. Heinrich,et al. Picosecond noninvasive optical detection of internal electrical signals in flip-chip-mounted silicon integrated circuits , 1990 .
[9] Tadao Nagatsuma,et al. An automated optical on-wafer probing system for ultra-high-speed ICs , 1992, Proceedings International Test Conference 1992.
[10] Sorab K. Ghandhi,et al. VLSI fabrication principles , 1983 .
[11] Richard H. Williams,et al. Testing Errors: Data and Calculations in an IC Manufacturing Process , 1992, Proceedings International Test Conference 1992.
[12] R. H. Koch,et al. Extremely low‐noise potentiometry with a scanning tunneling microscope , 1989 .
[13] D. C. Shaver,et al. Microcircuit Modification Using Focused Ion Beams , 1988, Medical Imaging.
[14] Tatsuya Adachi,et al. New applications of focused ion beam technique to failure analysis and process monitoring of VLSI , 1989 .
[15] Kees de Kort,et al. Waveform measurements with calibrated amplitude by electro-optic sampling in IC's , 1992 .
[16] Charles F. Hawkins,et al. IDDQ testing: A review , 1992, J. Electron. Test..
[17] Ajit Goel,et al. Liquid Crystal Technique as a Failure Analysis Tool , 1980, 18th International Reliability Physics Symposium.
[18] David M. Bloom,et al. Picosecond optical sampling of GaAs integrated circuits , 1988 .
[19] G. Neubauer,et al. Imaging VLSI cross sections by atomic force microscopy , 1992, 30th Annual Proceedings Reliability Physics 1992.
[20] James H. Richardson. Optical microscopy for the materials sciences , 1971 .
[21] Paul Muralt,et al. Scanning tunneling potentiometry , 1986 .
[22] John Hiatt,et al. A Method of Detecting Hot Spots on Semiconductors using Liquid Crystals , 1981, 19th International Reliability Physics Symposium.
[23] Hemantha K. Wickramasinghe,et al. High‐resolution magnetic imaging of domains in TbFe by force microscopy , 1988 .
[24] E.I. Cole,et al. Internal current probing of integrated circuits using magnetic force microscopy , 1993, 31st Annual Proceedings Reliability Physics 1993.
[25] Keith A. Jenkins,et al. Analysis of silicide process defects by non-contact electron-beam charging , 1992, 30th Annual Proceedings Reliability Physics 1992.
[26] G. J. Zissis. Infrared Technology Fundamentals , 1976 .
[27] John Spano,et al. New Failure Analysis Techniques for Beam Lead and Multi-Level Metal Integrated Circuits , 1976, 14th International Reliability Physics Symposium.
[28] Edward I. Cole,et al. Low electron beam energy CIVA analysis of passivated ICs , 1994 .
[29] M. T. Abramo,et al. Reactive ion etching for failure analysis applications , 1992, 30th Annual Proceedings Reliability Physics 1992.
[30] R. W. Armstrong,et al. In-depth resolutions of integrated circuits via X-ray based line modified asymmetric crystal topography , 1994, Proceedings of 1994 IEEE International Reliability Physics Symposium.
[31] W. Baerg,et al. Selective removal of dielectrics from integrated circuits for electron beam probing , 1992, 30th Annual Proceedings Reliability Physics 1992.
[32] P. Auger. Sur l'effet photoélectrique composé , 1925 .
[33] Alan C. Noble. IDA: A TOOL FOR COMPUTER-AIDED FAILURE ANALYSIS , 1992, Proceedings International Test Conference 1992.
[34] Ed Doyle,et al. Microelectronics Failure Analysis Techniques. A Procedural Guide , 1980 .
[35] L. Reimer,et al. Scanning Electron Microscopy , 1984 .
[36] H. K. Wickramasinghe,et al. Scanning thermal profiler , 1986 .
[37] C. L. Henderson,et al. The advent of failure analysis software technology , 1994, Proceedings of 1994 IEEE International Reliability Physics Symposium.
[38] Hemantha K. Wickramasinghe,et al. Magnetic force microscopy with 25 nm resolution , 1989 .
[39] Robert C. Aitken,et al. Diagnosis of leakage faults with IDDQ , 1992, J. Electron. Test..
[40] H. K. Wickramasinghe. Scanned-probe microscopes , 1989 .
[41] Thomas W. Lee,et al. Microelectronic failure analysis : desk reference , 1993 .
[42] R. E. Weber,et al. Auger electron spectroscopy for thin film analysis , 1972 .
[43] C. Sheppard,et al. Theory and practice of scanning optical microscopy , 1984 .
[44] J. Tyson,et al. Remote thermal imaging with 0.7‐μm spatial resolution using temperature‐dependent fluorescent thin flims , 1983 .
[45] David M. Bloom,et al. Picosecond electrical sampling using a scanning force microscope , 1992 .
[46] Y. Pastol,et al. Noncontact internal waveform measurements with picosecond time resolution on a 0.5- mu m CMOS SRAM , 1988, IEEE Electron Device Letters.
[47] J. Soden,et al. The use of light emission in failure analysis of CMOS ICs , 1990 .
[48] J. M. Soden,et al. Localization of pellicle-induced open contacts using Charge-Induced Voltage Alteration , 1993 .
[49] E.I. Cole,et al. Rapid localization of IC open conductors using charge-induced voltage alteration (CIVA) , 1992, 30th Annual Proceedings Reliability Physics 1992.
[50] C. R. Bagnell,et al. Resistive contrast imaging: A new SEM mode for failure analysis , 1986, IEEE Transactions on Electron Devices.
[51] J. Tyson,et al. Microscopic fluorescent imaging of surface temperature profiles with 0.01 °C resolution , 1982 .
[52] D. M. Bloom,et al. Voltage-contrast scanning probe microscopy , 1994 .
[53] C. Heiden,et al. Magnetic force microscopy: Current status and future trends , 1991 .
[54] Y. Martin,et al. Magnetic imaging by ‘‘force microscopy’’ with 1000 Å resolution , 1987 .
[55] Charles F. Hawkins,et al. Quiescent power supply current measurement for CMOS IC defect detection , 1989 .
[56] D. Day,et al. An integrating detector for serial scan thermal imaging , 1982 .
[57] Edward I. Cole. A New Technique for Imaging the Logic State of Passivated Conductors: Biased Resistive Contrast Imaging , 1990 .
[58] P Sudraud,et al. Focused Ion Beams For Optoelectronic Technology: A Review. , 1987, Other Conferences.
[59] Roy H. Propst,et al. A novel method for depth profiling and imaging of semiconductor devices using capacitive coupling voltage contrast , 1987 .
[60] Edward I. Cole,et al. Novel failure analysis techniques using photon probing with a scanning optical microscope , 1994, Proceedings of 1994 IEEE International Reliability Physics Symposium.
[61] W. E. Reese. Use of a Pulse Laser Technique in Failure Analysis , 1973 .