Oxidation of Silicon Nitride Sintered with Rare-Earth Oxide Additions
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The effects of rare-earth oxide additions on the oxidation of sintered Si3N4 were examined. Insignificant oxidation occurred at 700o and 1000oC, with no evidence of phase instability. At 1372oC, the oxidation rate was lowest for Y203 and increased for additions of La2O3, Sm2O3, and CeO2, in that order. Data obtained from X-ray diffraction, electron microprobe analysis, and scanning electron microscopy indicate that oxidation occurs via diffusion of cationic species from Si3N4 grain boundaries.
[1] A. Bellosi,et al. A diffusion model for the oxidation of hot pressed Si3N4-Y2O3-SiO2 materials , 1984 .
[2] C. C. Wu,et al. Oxidation weight gain and strength degradation of Si3 N4 with various additives , 1981 .
[3] K. Lau,et al. Kinetics of Oxidation of Hot‐Pressed Silicon Nitride Containing Magnesia , 1978 .
[4] R. Pearson,et al. Kernel Migration for HTGR Fuels from the System Th‐U‐Pu‐C‐O‐N , 1977 .