144 °C operation of 1.3 μm InGaAsP vertical cavity lasers on GaAs substrates
暂无分享,去创建一个
Masayuki Ishikawa | John E. Bowers | Richard P. Mirin | Evelyn L. Hu | Dubravko I. Babic | B. I. Miller | B. Miller | J. Bowers | R. Mirin | E. Hu | D. Babic | M. Ishikawa | J. Dudley | Wenbin Jiang | J. J. Dudley | Wenbin Jiang
[1] A. Kasukawa,et al. GaInAsP/InP Semiconductor Multilayer Reflector Grwon by Metalorganic Chemical Vapor Deposition and its Application to Surface Emitting Laser Diode , 1990 .
[2] F. Koyama,et al. Room-temperature continuous wave lasing characteristics of a GaAs vertical cavity surface-emitting laser , 1989 .
[3] H. Okamoto,et al. Room temperature pulsed operation of 1.5 mu m GaInAsP/InP vertical-cavity surface-emitting laser , 1992, IEEE Photonics Technology Letters.
[4] L. Coldren,et al. InGaAs vertical-cavity surface-emitting lasers , 1991 .
[5] D. E. Mull,et al. Wafer fusion: A novel technique for optoelectronic device fabrication and monolithic integration , 1990 .
[6] U. Koren,et al. Low-threshold, high-temperature pulsed operation of InGaAsP/InP vertical cavity surface emitting lasers , 1991, IEEE Photonics Technology Letters.
[7] Jack L. Jewell,et al. Room-Temperature Continuous-Wave Vertical-Cavity Single-Quantum-Well Microlaser Diodes , 1989 .
[8] M. A. Koza,et al. Bonding by atomic rearrangement of InP/InGaAsP 1.5 μm wavelength lasers on GaAs substrates , 1991 .
[9] A. Y. Cho,et al. 90% coupling of top surface emitting GaAs/AlGaAs quantum well laser output into 8 mu m diameter core silica fibre , 1990 .