Gas Barrier Performances of Silica Films Deposited on Poly(Ethylene Terephthalate) Substrates by Plasma-Enhanced CVD
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[1] H. Sugimura,et al. Growth Manner of Silica Film on Polyethylene Terephthalate Substrates in Plasma-Enhanced Chemical Vapor Deposition , 2003 .
[2] H. Sugimura,et al. Gas Barrier Performance of Surface-Modified Silica Films with Grafted Organosilane Molecules , 2003 .
[3] H. Sugimura,et al. Transparent Silica Films Deposited by Low‐Temperature Plasma‐Enhanced CVD Using Hexamethyldisiloxane , 2002 .
[4] D. Bergbreiter,et al. Surface Functionalized Polypropylene: Synthesis, Characterization, and Adhesion Properties , 2001 .
[5] G. Dennler,et al. Studies of the earliest stages of plasma-enhanced chemical vapor deposition of SiO2 on polymeric substrates , 2001 .
[6] †. A. F. Poncin-Epaillard,et al. Relations between Surface Energy and Surface Potentials of a Nitrogen Plasma-Modified Polypropylene , 2000 .
[7] R. Noble,et al. Polyimide-silica composite materials: How does silica influence their microstructure and gas permeation properties? , 1999 .
[8] Tai-Ju Chen,et al. Investigation of silicon oxide films prepared by room-temperature ion plating , 1998 .
[9] S. Maiti,et al. Surface modification and evaluation of polyethylene film , 1998 .
[10] N. Harvey,et al. Activated Rate Theory Treatment of Oxygen and Water Transport through Silicon Oxide/Poly(ethylene terephthalate) Composite Barrier Structures , 1997 .
[11] T. Mizutani,et al. Optical properties and structrue of SiO2 films prepared by ion-beam sputtering , 1996 .
[12] N. Mermilliod,et al. Improvement of polypropylene film adhesion in multilayers by various chemical surface modifications , 1995 .
[13] M. Kogoma,et al. Synthesis of plasma-polymerized tetraethoxysilane and hexamethyldisiloxane films prepared by atmospheric pressure glow discharge , 1995 .
[14] R. Singh,et al. Prediction of oxygen transport parameters of plastic packaging materials from transient state measurements , 1995 .
[15] J. Theil,et al. Carbon content of silicon oxide films deposited by room temperature plasma enhanced chemical vapor deposition of hexamethyldisiloxane and oxygen , 1994 .