Line edge roughness investigation on chemically amplified resist materials with masked Helium ion beam lithography
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Evangelos Gogolides | Hans Loeschner | George P. Patsis | V. Constantoudis | Stefan Eder-Kapl | W. Fallmann | Oliver Kirch | E. Gogolides | V. Constantoudis | G. Patsis | S. Eder-Kapl | H. Loeschner | M. Zeininger | W. Fallmann | O. Kirch | Michalea Zeininger
[1] W. Henke,et al. Modeling of edge roughness in ion projection lithography , 1999 .
[2] Franco Cerrina,et al. Depth dependence of resist line-edge roughness: Relation to photoacid diffusion length , 2002 .
[3] Jangho Shin,et al. Resist line edge roughness and aerial image contrast , 2001 .