Structures and Characterizations of TiVCr and TiVCrZrY Films Deposited by Magnetron Sputtering under Different Bias Powers
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Shou-Yi Chang | Fuh-Sheng Shieu | M. Deng | Du-Cheng Tsai | F. Shieu | Shou-Yi Chang | H. Yao | Du-Cheng Tsai | Hsiao-Chiang Yao | Min-Jen Deng
[1] L. Toth. Transition Metal Carbides and Nitrides , 1971 .
[2] S. Barnett,et al. Bias Sputter Deposition of Dense Yttria‐Stabilized Zirconia Films on Porous Substrates , 1995 .
[3] Atomic-scale modeling of low-energy ion-solid processes , 1988 .
[4] O. Kraft,et al. Solid solution alloy effects on microstructure and indentation hardness in Pt-Ru thin films , 2001 .
[5] D. Shoesmith,et al. Modeling the Failure of Nuclear Waste Containers , 1997 .
[6] Jong-Kuek Park,et al. Grain size refinement of the diamond film deposited on the WC–Co cutting inserts using direct current biasing , 2003 .
[7] J. Wang,et al. Reduction of Ru Underlayer Thickness for CoCrPt–SiO$_2$Perpendicular Recording Media , 2006, IEEE Transactions on Magnetics.
[8] Ramesh Chandra,et al. Influence of the sputtering gas on the preferred orientation of nanocrystalline titanium nitride thin films , 2002 .
[9] F. Shieu,et al. Influence of radio frequency bias on the characteristics of TiO2 thin films prepared by DC sputtering , 2006 .
[10] A. Korhonen,et al. Plasma nitriding and ion plating with an intensified glow discharge , 1983 .
[11] M. Zlatanović,et al. Effect of plasma nitriding on the properties of (Ti, Al)N coatings deposited onto hot work steel substrates , 1993 .
[12] T. Shun,et al. Nanostructured High‐Entropy Alloys with Multiple Principal Elements: Novel Alloy Design Concepts and Outcomes , 2004 .
[13] C. C. Wang,et al. Characterization of AlN Thin Films Prepared by Unbalanced Magnetron Sputtering , 2004 .
[14] E. Pascual,et al. Effect of ion bombardment on the properties of B 4 C thin films deposited by RF sputtering , 1999 .
[15] A. Madan,et al. Mechanical properties and thermal stability of TiN∕TiB2 nanolayered thin films , 2005 .
[16] K. Pfaffinger,et al. Structure and Strength Effects in CVD Titanium Carbide and Titanium Nitride Coatings , 1976 .
[17] R. Lin,et al. Sputter-deposited nanocrystalline Cr and CrN coatings on steels , 2001 .
[18] L. Alexander,et al. X-Ray diffraction procedures for polycrystalline and amorphous materials , 1974 .
[19] Ching-Tung Hsu,et al. The Effect of Boron on the Corrosion Resistance of the High Entropy Alloys Al0.5CoCrCuFeNiB x , 2007 .
[20] H. Makita,et al. Reducing the grain size for fabrication of nanocrystalline diamond films , 2001 .
[21] Ray Y. Lin,et al. Amorphous molybdenum nitride thin films prepared by reactive sputter deposition , 2004 .
[22] C. Eggs,et al. Investigation of stored energy in plasma deposited TiNx films , 1997 .
[23] D. Shoesmith,et al. Hydrogen Absorption and the Lifetime Performance of Titanium Nuclear Waste Containers , 2000 .
[24] A. K. Suri,et al. Influence of the Ar/N2 ratio on the preferred orientation and optical reflectance of reactively sputter deposited titanium nitride thin films , 2003 .
[25] B. Chapman,et al. Glow Discharge Processes: Sputtering and Plasma Etching , 1980 .
[26] Jia-Hong Huang,et al. Effect of substrate bias on the structure and properties of ion-plated ZrN on Si and stainless steel substrates , 2003 .
[27] F. Shieu,et al. Characterization and Formation Mechanism of Macroparticles in Arc Ion-Plated CrN Thin Films , 2003 .
[28] R. Boyer. An overview on the use of titanium in the aerospace industry , 1996 .
[29] J. Sivertsen,et al. Effects of RF bias on the texture, magnetics, and recording properties of RF sputtered CoCr/Cr longitudinal thin film media , 1990 .
[30] Choong-Nyeon Park,et al. Hydrogen absorption–desorption characteristics of Ti(0.22 + X)Cr(0.28 + 1.5X)V(0.5 − 2.5X) (0 ≤ X ≤ 0.12) alloys , 2005 .
[31] J. Dutkiewicz,et al. Effect of Mechanical Alloying on Structure and Hardness of TiAl-V Powders , 2004 .
[32] Jiecai Han,et al. Effects of mass density on the microhardness and modulus of tetrahedral amorphous carbon films , 2007 .
[33] Marcus Textor,et al. Titanium in Medicine : material science, surface science, engineering, biological responses and medical applications , 2001 .
[34] J. Thornton. The microstructure of sputter-deposited coatings , 1986 .
[35] G. Libowitz,et al. Hydride formation rates of titanium-based b.c.c. solid solution alloys☆ , 1984 .
[36] D. Lee,et al. Influence of sputtering parameters on microstructure and morphology of TiO2 thin films , 2002 .