This paper describes a conceptual measurement machine design, aiming for universal and noncontact form measurement of free-form optical surfaces up to O 500 mm with an uncertainty of 30 nm (k = 2). This conceptual design is the result of a M.Sc. graduation assignment done within Eindhoven University of Technology (TU/e) in collaboration with TNO TPD. Recently a PhD study has started at TU/e called NANOMEFOS (Nanometer Accuracy Non-contact Measurement of Free-form Optical Surfaces), to further develop this concept. In this paper, first the requirements and current metrology methods with respect to these requirements will be discussed. Next, the machine concept and the calculation of the error budget will be explained. Finally, a short overview of the current design will be given.
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