Investigation of LRS dependence on the retention of HRS in CBRAM
暂无分享,去创建一个
Qi Liu | S. Long | Ming Liu | H. Lv | Guoming Wang | Q. Luo | Xiaoxin Xu | Hongtao Liu | Tiancheng Gong | Ming Wang | Meiyun Zhang | Yang Li
[1] J. Cluzel,et al. Impact of SET and RESET conditions on CBRAM high temperature data retention , 2014, 2014 IEEE International Reliability Physics Symposium.
[2] Zongliang Huo,et al. Gate induced resistive switching in 1T1R structure with improved uniformity and better data retention , 2014, 2014 IEEE 6th International Memory Workshop (IMW).
[3] S. Maikap,et al. Enhanced resistive switching memory characteristics and mechanism using a Ti nanolayer at the W/TaOx interface , 2014, Nanoscale Research Letters.
[4] J. Guy,et al. Investigation of the physical mechanisms governing data-retention in down to 10nm nano-trench Al2O3/CuTeGe conductive bridge RAM (CBRAM) , 2013, 2013 IEEE International Electron Devices Meeting.
[5] S. Maikap,et al. Retraction: Enhanced resistive switching memory characteristics and mechanism using a Ti nanolayer at the W/TaOx interface , 2013, Nanoscale Research Letters.
[6] Amit Prakash,et al. TaOx-based resistive switching memories: prospective and challenges , 2013, Nanoscale Research Letters.
[7] Malgorzata Jurczak,et al. A Thermally Stable and High-Performance 90-nm ${\rm Al}_{2}{\rm O}_{3}\backslash{\rm Cu}$-Based 1T1R CBRAM Cell , 2013, IEEE Transactions on Electron Devices.
[8] W. Tsai,et al. High-Performance Programmable Metallization Cell Memory With the Pyramid-Structured Electrode , 2013, IEEE Electron Device Letters.
[9] S. Muraoka,et al. Comprehensive understanding of conductive filament characteristics and retention properties for highly reliable ReRAM , 2013, 2013 Symposium on VLSI Technology.
[10] T. Takagi,et al. Conductive Filament Scaling of ${\rm TaO}_{\rm x}$ Bipolar ReRAM for Improving Data Retention Under Low Operation Current , 2013, IEEE Transactions on Electron Devices.
[11] L. Goux,et al. Endurance/Retention Trade-off on $\hbox{HfO}_{2}/\hbox{Metal}$ Cap 1T1R Bipolar RRAM , 2013, IEEE Transactions on Electron Devices.
[12] J Joshua Yang,et al. Memristive devices for computing. , 2013, Nature nanotechnology.
[13] Yu-Lun Chueh,et al. Resistive switching of Au/ZnO/Au resistive memory: an in situ observation of conductive bridge formation , 2012, Nanoscale Research Letters.
[14] Frederick T. Chen,et al. Excellent resistive memory characteristics and switching mechanism using a Ti nanolayer at the Cu/TaOx interface , 2012, Nanoscale Research Letters.
[15] S. Balatti,et al. Evidence for Voltage-Driven Set/Reset Processes in Bipolar Switching RRAM , 2012, IEEE Transactions on Electron Devices.
[16] Z. Wei,et al. Retention Model for High-Density ReRAM , 2012, 2012 4th IEEE International Memory Workshop.
[17] Qi Liu,et al. Real‐Time Observation on Dynamic Growth/Dissolution of Conductive Filaments in Oxide‐Electrolyte‐Based ReRAM , 2012, Advanced materials.
[18] Y. Liu,et al. Linear Scaling of Reset Current Down to 22-nm Node for a Novel $\hbox{Cu}_{x}\hbox{Si}_{y}\hbox{O}$ RRAM , 2012, IEEE Electron Device Letters.
[19] R. Williams,et al. Sub-nanosecond switching of a tantalum oxide memristor , 2011, Nanotechnology.
[20] Daniele Ielmini,et al. Filament diffusion model for simulating reset and retention processes in RRAM , 2011 .
[21] Shimeng Yu,et al. Compact Modeling of Conducting-Bridge Random-Access Memory (CBRAM) , 2011, IEEE Transactions on Electron Devices.
[22] T. Tang,et al. Improvement of Resistive Switching Uniformity by Introducing a Thin GST Interface Layer , 2010, IEEE Electron Device Letters.
[23] D. Ielmini,et al. Size-Dependent Retention Time in NiO-Based Resistive-Switching Memories , 2010, IEEE Electron Device Letters.
[24] R. Dittmann,et al. Redox‐Based Resistive Switching Memories – Nanoionic Mechanisms, Prospects, and Challenges , 2009, Advanced materials.
[25] R. Bruchhaus,et al. Investigation of the Reliability Behavior of Conductive-Bridging Memory Cells , 2009, IEEE Electron Device Letters.
[26] Qi Liu,et al. On the resistive switching mechanisms of Cu/ZrO2:Cu/Pt , 2008 .
[27] Z. Wei,et al. Highly reliable TaOx ReRAM and direct evidence of redox reaction mechanism , 2008, 2008 IEEE International Electron Devices Meeting.
[28] R. Symanczyk,et al. Conductive bridging RAM (CBRAM): an emerging non-volatile memory technology scalable to sub 20nm , 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..