Actinic EUVL mask blank inspection and phase defect characterization

We have developed an actinic full-field mask blank inspection system to detect multilayer phase defects with dark field imaging. Using this system a non-commercial mask was inspected and real defects were detected by setting the system at low false detection threshold. A 1.5 mm square area (containing no absorber) was inspected three times, and probabilities of defect detection and false detection were evaluated. Of the total number detected, 81.5 % of them exhibited 100% percent probability of detection, while 0.8 % of them indicated false detection. The same area was also inspected with a conventional inspection system, and both inspection results then were compared. Among the defects detected, 94 % of them could be detected only with the actinic system, while 1.1 % of them could be detected only with the conventional laser-based inspection system. The detected defects were observed with AFM and SEM. In summary, phase defects smaller than 100 nm could be detected only with the actinic system, while particles smaller than 200 nm could be detected only with the conventional system.