In-situ beam metrology in shaped-beam lithography tool
暂无分享，去创建一个
Takashi Kamikubo | Shuichi Tamamushi | Hitoshi Sunaoshi | Kenji Ohtoshi | Victor Katsap | Rodney A. Kendall | Steven Douglas Golladay
[1] H. Namatsu,et al. Electron-Beam Diameter Measurement Using a Knife Edge with a Visor for Scattering Electrons , 2003 .
[2] Ming L. Yu,et al. Exploring the fundamental limit of CD control: shot noise and CD uniformity improvement through resist thickness , 2005, Photomask Japan.