Abstract The productivity enhancement in microelectronics requires — among other measures — an increase in wafer diameter, such as the current transition from 200 to 300 mm. This transition of wafer diameter implicates an increase of fab costs, especially equipment costs, as well as an increase of costs for silicon material. Two approaches are suited to reduce the total wafer costs: the integration of metrology into processing tools and the abundant use of reclaim wafers. With both methods, a wafer cost reduction can be achieved by reducing the amount of monitor and test wafers and by re-usage of misprocessed product wafers. The examples for Integrated Metrology given in the paper are ellipsometer integration into a cluster tool, integrated scatterometry for fast fault detection, and in situ particle measurement. The possible savings in test and monitor wafers, which can be achieved by integration of metrology, strongly depend on process technology, process flow, the process itself, and equipment. For mass products like memories, the amount of monitor and test wafers could be reduced by half and for ASICS even more. This means a total reduction in wafer expenditure of 7–15% for ASIC production, and even 15–25% may be reached for mass production. Savings in this order require a fab-wide integration of metrology. A prerequisite is the development of standardized approaches for the integration of metrology comprehending standardized hardware and software interfaces. Integrated metrology can reduce the amount of material transport and wafer handling and also improve the equipment utilization and maintenance. The control paradigm can thus be shifted from a lot-to-lot basis to a wafer-to-wafer basis for the 300 mm technology. For wafer reclaim it could be shown that the reclaiming of non-productive wafers allows an increase in the profitability of an advanced wafer fab. In contrast to conventional wafer reclaim, different quality levels optimized for the accordingly different applications in a wafer fab were defined. Quality control of reclaimed wafers is of utmost importance within each specified level. The efficiency of the reclaim service can be significantly increased by an application-specific wafer reclaim model consisting of different quality levels. However, optimized strategies further require closer linking of IC production and wafer reclaim with optimized logistics.
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