Improve scanner matching using automated real-time feedback control via scanner match maker (SMM)

Traditional "matching matrix" methods for characterizing scanner matching assume that the scanner distortion performance is static. The latest scanner models can adjust the distortion performance dynamically, at run-time. The Scanner Match Maker (SMM) system facilitates calculation and application of these run-time adjustments, improving effective overlay performance of the scanner fleet, allowing more flexibility for mix-and-match exposure. The overlay |mean|+3s performance was improved significantly for a layer pair that is currently allowed mix-and-match pairing.

[1]  Yuuki Ishii,et al.  A system to optimize mix-and-match overlay in lithography , 2008, SPIE Advanced Lithography.

[2]  Yuuki Ishii,et al.  Improved overlay control through automated high order compensation , 2007, SPIE Advanced Lithography.