论文信息 - Low-debris, efficient laser-produced plasma extreme ultraviolet source by use of a regenerative liquid microjet target containing tin dioxide (SnO2)nanoparticles

Low-debris, efficient laser-produced plasma extreme ultraviolet source by use of a regenerative liquid microjet target containing tin dioxide (SnO2)nanoparticles

We demonstrated a low-debris, efficient laser-produced plasma extreme ultraviolet (EUV) source by use of a regenerative liquid microjet target containing tin-dioxide (SnO2) nanoparticles. By using a low SnO2 concentration (6%) solution and dual laser pulses for the plasma control, we observed the EUV conversion efficiency of 1.2% with undetectable debris.

Takeshi Higashiguchi | Wataru Sasaki | Shoichi Kubodera | Naoto Dojyo | Masaya Hamada

[1] Luke McKinney,et al. Variable composition laser-produced Sn plasmas—a study of their time-independent ion distributions , 2004 .

[2] Debris characteristics of a laser-produced tin plasma for extreme ultraviolet source , 2005 .

[3] Hans M. Hertz,et al. Droplet target for low-debris laser-plasma soft X-ray generation , 1993 .

[4] Hans M. Hertz,et al. Liquid-tin-jet laser-plasma extreme ultraviolet generation , 2004 .

[5] Hiroaki Nishimura,et al. Characterization of density profile of laser-produced Sn plasma for 13.5nm extreme ultraviolet source , 2005 .

[6] Takeshi Higashiguchi,et al. Parametric optimization of a narrow-band 13.5-nm emission from a Li-based liquid-jet target using dual nano-second laser pulses , 2005 .

[7] G. O'Sullivan,et al. Tunable narrowband soft x-ray source for projection lithography , 1994 .

[8] Martin Richardson,et al. High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography , 2004 .

[9] G. Tonon,et al. X‐ray emission in laser‐produced plasmas , 1973 .

[10] R. H. Stulen,et al. Extreme ultraviolet lithography , 1998 .