论文信息 - Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography - 字舞流文

Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography

V. Guzenko | A. Voigt | G. Grützner | I. Harder | Stefan Pfirrmann | Anett Kolander | Olga Lohse