Improvement of unbalanced illumination induced telecentricity within the exposure slit
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Richard Droste | Jonghoon Jang | ByeongSoo Lee | Young Seog Kang | Chansam Chang | Jeong-Heung Kong | Young Ha Kim | Wim Bouman | Roelof de Graaf | Stefan Weichselbaum | Wim P. de Boeij | Bart van Bussel | Patrick Neefs | Arij Rijke
[1] Jin-Ha Kim,et al. Pattern deformation induced from intensity-unbalanced off-axis illumination , 1997, Advanced Lithography.
[2] Stephen P. Renwick. Quasi-telecentricity: the effects of unbalanced multipole illumination , 2007, SPIE Advanced Lithography.
[3] Takashi Sato,et al. Overlay error due to lens coma and asymmetric illumination dependence on pattern features , 1998, Advanced Lithography.