Chemical Vapor Deposition of Iridium, Platinum, Rhodium and Palladium

This article reviews the progress in the chemical vapor deposition of iridium, platinum, rhodium and palladium metals. In the course of the last decade the number of articles on CVD of this group of metals has increased significantly. A wide variety of metal organic complexes have been investigated as potential precursors and appreciable results have been obtained. However, some aspects such as low deposition rates and impurity incorporation into the films still remain as concerns in this area. The representative results on CVD of these metals are presented according to the type of metal organic complexes used.

[1]  G. Girolami,et al.  “Tailored” organometallics as precursors for the chemical vapor deposition of high-purity palladium and platinum thin films , 1988 .

[2]  R. Puddephatt,et al.  Allyl(β‐diketonato)palladium(II) complexes as precursors for palladium films , 1994 .

[3]  H. Suhr,et al.  Deposition of thin rhodium films by plasma-enhanced chemical vapor deposition , 1989 .

[4]  M. Rand.  I‐V Characteristics of PtSi ‐ Si Contacts Made from CVD Platinum , 1975 .

[5]  E. Stern,et al.  Low-temperature vapour deposition of high-purity iridium coatings from cyclooctadiene complexes of iridium. Synthesis of a novel liquid iridium chemical vapour deposition precursor , 1991 .

[6]  T. Hirai,et al.  Preparation of epitaxial AlN films by electron cyclotron resonance plasma‐assisted chemical vapor deposition on Ir‐ and Pt‐coated sapphire substrates , 1994 .

[7]  R. Dittmeyer,et al.  CVD preparation of catalytic membranes for reduction of nitrates in water , 2001 .

[8]  R. Hicks,et al.  Organometallic chemical vapor deposition of platinum. Reaction kinetics and vapor pressures of precursors , 1992 .

[9]  P. Serp,et al.  Mechanistic studies of the activation and the decomposition of [Rh2Cl2(CO)4] in organometallic chemical vapour deposition , 1995 .

[10]  Sujit Roy,et al.  Chemical vapor deposition of platinum: new precursors and their properties , 1991 .

[11]  R. Hance,et al.  Iridium precursor pyrolysis and oxidation reactions and direct liquid injection chemical vapor deposition of iridium films , 2001 .

[12]  T. Hirai,et al.  Preparation of iridium clusters by MOCVD and their electrochemical properties , 1996 .

[13]  R. R. Thomas,et al.  Vapor Phase Deposition of Palladium for Electroless Copper Plating , 1989 .

[14]  Chusheng Chen,et al.  Palladium membranes supported on porous ceramics prepared by chemical vapor deposition , 1997 .

[15]  R. Sievers,et al.  Vapor Deposition of Metals by Hydrogen Reduction of Metal Chelates , 1965 .

[16]  F. Maury,et al.  Iridium coatings grown by metal-organic chemical vapor deposition in a hot-wall CVD reactor , 2003 .

[17]  Jean‐Cyrille Hierso,et al.  PLATINUM, PALLADIUM AND RHODIUM COMPLEXES AS VOLATILE PRECURSORS FOR DEPOSITING MATERIALS , 1998 .

[18]  D. Hsu.  50 nm linewidth platinum sidewall lithography by effusive‐source metal precursor chemical deposition and ion‐assisted etching , 1991 .

[19]  Yao-Lun Chen,et al.  Deposition of Iridium Thin Films Using New IrI CVD Precursors , 2002 .

[20]  Jean‐Cyrille Hierso,et al.  Metal-organic chemical vapor deposition in a fluidized bed as a versatile method to prepare layered bimetallic nanoparticles , 1998 .

[21]  Shih‐Yuan Lu,et al.  Pd–Ag alloy films prepared by metallorganic chemical vapor deposition process , 2000 .

[22]  Soon-Gil Yoon,et al.  Preparation of Pt thin films deposited by metalorganic chemical vapor deposition for ferroelectric thin films , 1997 .

[23]  C. Jun.  Palladium and palladium alloy composite membranes prepared by metal-organic chemical vapor deposition method (cold-wall) , 2000 .

[24]  M. Hampden‐Smith,et al.  Palladium Thin Films Grown by CVD from (1,1,1,5,5,5‐Hexafluoro‐2,4‐pentanedionato) Palladium(II) , 1997 .

[25]  M. Newton,et al.  Single crystal and high area titania supported rhodium: the interaction of supported Rh(CO)2 with NO , 2001 .

[26]  Ho-Gi Kim,et al.  Integration of platinum bottom electrode on poly-Si for ferroelectric thin films , 1999 .

[27]  E. Reznikova,et al.  Corrosion testing of platinum metals CVD coated titanium anodes in seawater-simulated solutions ☆ , 2001 .

[28]  Sujit Roy,et al.  New precursors for chemical vapour deposition of platinum and the hydrogen effect on cvd , 1989 .

[29]  G. Meng,et al.  Pd Ni thin films grown on porous Al2O3 substrates by metalorganic chemical vapor deposition for hydrogen sensing , 1999 .

[30]  T. Hirai,et al.  Electrochemical properties of iridium-carbon nano composite films prepared by MOCVD , 2001 .

[31]  K. Wise,et al.  A silicon micromachined conductometric gas sensor with a maskless Pt sensing film deposited by selected-area CVD , 1996 .

[32]  Jean-Cyrille Hierso,et al.  Organometallic Chemical Vapor Deposition of Palladium under Very Mild Conditions of Temperature in the Presence of a Low Reactive Gas Partial Pressure , 1996 .

[33]  F. Klein,et al.  Precursor development for the chemical vapor deposition of aluminium, copper and palladium , 1995 .

[34]  R. Nuzzo,et al.  Surface-selective deposition of palladium and silver films from metal-organic precursors: a novel metal-organic chemical vapor deposition redox transmetalation process , 1993 .

[35]  Daniel Braichotte,et al.  Gas phase versus surface contributions to photolytic laser chemical vapor deposition rates , 1988 .

[36]  K. Dahmen,et al.  Growth of iridium films by metal organic chemical vapour deposition , 1994 .

[37]  J. Hayashi,et al.  Development of supported thin palladium membrane and application to enhancement of propane aromatization on Ga-silicate catalyst , 1996 .

[38]  T. Sham,et al.  Dimethylpalladium(II) Complexes as Precursors for Chemical Vapor Deposition of Palladium , 1994 .

[39]  R. Hicks,et al.  Low‐temperature organometallic chemical vapor deposition of platinum , 1988 .

[40]  T. Hirai,et al.  Epitaxial growth of iridium and platinum films on sapphire by metalorganic chemical vapor deposition , 1994 .

[41]  G. Girolami,et al.  Low Temperature MoCVD Routes to Thin Films from Transition Metal Precursors , 1989 .

[42]  J. Zink,et al.  Laser-assisted organometallic chemical vapor deposition of films of rhodium and iridium , 1992 .

[43]  A. Gavriilidis,et al.  Preparation of axially non-uniform Pd catalytic monoliths by chemical vapour deposition , 2001 .

[44]  R. Williams,et al.  Characterization of (methylcyclopentadienyl)trimethylplatinum and low-temperature organometallic chemical vapor deposition of platinum metal , 1989 .

[45]  P. Serp,et al.  Chemical vapor deposition methods for the controlled preparation of supported catalytic materials. , 2002, Chemical reviews.

[46]  V. S. Kravchenko,et al.  Technology of fabrication and electrical characteristics of W, Mo, Ni and Ir, Pd contacts with YBa2Cu3O7-x , 1991 .

[47]  P. Serp,et al.  One-step preparation of highly dispersed supported rhodium catalysts by low-temperature organometallic chemical vapor deposition , 1995 .

[48]  H. Suhr,et al.  Thin palladium films prepared by metal-organic plasma-enhanced chemical vapour deposition☆ , 1988 .

[49]  P. Serp,et al.  MOCVD of rhodium, palladium and platinum complexes on fluidized divided substrates: Novel process for one‐step preparation of noble‐metal catalysts , 1998 .

[50]  Myron J. Rand,et al.  Chemical Vapor Deposition of Thin‐Film Platinum , 1973 .

[51]  Chusheng Chen,et al.  Preparation and characterization of Pd and Pd-Ni alloy membranes on porous substrates by MOCVD with mixed metal β-diketone precursors , 1997 .

[52]  M. Newton,et al.  A comparison of the chemistry of RhI(acac)(CO)2 and RhI(CO)2Cl adsorbed on TiO2[110]: development of particulate Rh and oxidative disruption by CO , 2000 .

[53]  R. Psaro,et al.  Supported metals derived from organometallics , 1998 .

[54]  J. White,et al.  Ir deposition by surface combustion of (MeCp)Ir(COD): An experimental simulation of metallorganic chemical vapor deposition , 2001 .

[55]  P. Serp,et al.  A versatile one-step method for the preparation of highly dispersed metal supported catalysts , 1995 .

[56]  P. Majhi,et al.  Preparation of Iridium Films by Liquid Source Metalorganic Chemical Vapor Deposition , 1999 .

[57]  P. Kirsch,et al.  Precursor chemistry and film growth with (methylcyclopentadienyl) (1,5-cyclooctadiene)iridium , 2000 .

[58]  R. Mahaffy,et al.  Iridium film growth with indium tris-acetylacetonate: oxygen and substrate effects , 1999 .

[59]  Y. S. Lin,et al.  Fabrication of a Thin Palladium Membrane Supported in a Porous Ceramic Substrate by Chemical-Vapor-Deposition , 1996 .

[60]  J. White,et al.  Adsorption and decomposition of (methylcyclopentadienyl) (1,5-cyclooctadiene) iridium on Rh , 2001 .

[61]  R. Nuzzo,et al.  Mechanistic Studies of Palladium Thin Film Growth from Palladium(II) β-Diketonates. 2. Kinetic Analysis of the Transmetalation Reaction of Bis(hexafluoroacetylacetonato)palladium(II) on Copper Surfaces , 1996 .

[62]  Nanometer scale patterning by scanning tunneling microscope assisted chemical vapour deposition , 2000 .

[63]  T. H. Baum,et al.  Laser-induced chemical vapor deposition of metals for microelectronics technology , 1992 .

[64]  R. Nuzzo,et al.  Mechanistic Studies of Palladium Thin Film Growth from Palladium(II) β-Diketonates. 1. Spectroscopic Studies of the Reactions of Bis(hexafluoroacetylacetonato)palladium(II) on Copper Surfaces , 1996 .

[65]  M. Rand,et al.  Composition profiles of CVD platinum and platinum silicide by Auger electron spectroscopy and secondary ion mass spectrometry , 1974 .

[66]  T. Nabatame,et al.  Platinum Film Growth by Chemical Vapor Deposition Based on Autocatalytic Oxidative Decomposition , 2001 .

[67]  P. Majhi,et al.  Highly (111)-oriented and conformal iridium films by liquid source metalorganic chemical vapor deposition , 2001 .

[68]  R. Williams,et al.  Low-Temperature Organometallic Chemical Vapor Deposition of Transition Metals , 1988 .

[69]  B. Hayden,et al.  The chemistry of rhodium on TiO2(110) deposited by MOCVD of [Rh(CO)2Cl]2 and MVD , 1994 .

[70]  R. Nuzzo,et al.  Selective chemical vapor deposition of platinum and palladium directed by monolayers patterned using microcontact printing , 1997 .

[71]  G. Rossetto,et al.  Nanocrystalline Pt thin films obtained via metal organic chemical vapor deposition on quartz and CaF2 substrates: an investigation of their chemico-physical properties , 2002 .

[72]  M. Hampden‐Smith,et al.  Chemical vapor deposition of metals: Part 1. An overview of CVD processes , 1995 .

[73]  T. Nabatame,et al.  Crystallographic and electrical properties of platinum film grown by chemical vapor deposition using (methylcyclopentadienyl)trimethylplatinum , 2002 .

[74]  P. Netter,et al.  Oxidation Resistant Coatings Produced by Chemical Vapor Deposition :Iridium and Aluminum Oxynitride Coatings , 1989 .

[75]  Yuehe Lin,et al.  Fabrication of thin metallic membranes by MOCVD and sputtering , 1997 .

[76]  R. Dittmeyer,et al.  Studies on the use of catalytic membranes for reduction of nitrate in drinking water , 1999 .

[77]  I. Igumenov,et al.  Effect of the deposition temperature on the iridum film microstructure produced by metal-organic chemical vapour deposition: sample characterization using x-ray techniques , 1993 .

[78]  I. Igumenov.  MO CVD of Noble Metals , 1995 .

[79]  R. Puddephatt.  Reactivity and mechanism in the chemical vapour deposition of late transition metals , 1994 .

[80]  R. Raj,et al.  Ultrahigh vacuum chemical vapor deposition of rhodium thin films on clean and TiO2-covered Si(111) , 1992 .

[81]  F. H. Hsu,et al.  Studies of cyclodextrin complexes by positron annihilation , 1993 .

[82]  G. Stauf,et al.  Patterned photoassisted organometallic deposition of iron, nickel and palladium on silicon , 1988 .

[83]  T. H. Baum,et al.  New Precursors for Chemical Vapor Deposition of Iridium , 1998 .