Flexible Control of Block Copolymer Directed Self‐Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning

www.MaterialsViews.com C O M M U N IC A IO N He Yi , Xin-Yu Bao , Jie Zhang , Christopher Bencher , Li-Wen Chang , Xiangyu Chen , Richard Tiberio , James Conway , Huixiong Dai , Yongmei Chen , Subhasish Mitra , and H.-S. Philip Wong * Flexible Control of Block Copolymer Directed SelfAssembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning

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