Control of stress in highly doped polysilicon multi-layer diaphragm structure
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Jianmin Miao | Rongming Lin | Lihui Guo | J. Miao | R. Lin | L. Chen | Lihui Guo | Longqing Chen
[1] T. Christenson,et al. Fabrication of micromechanical devices from polysilicon films with smooth surfaces , 1989 .
[2] N. Proust,et al. Structure and crystal growth of atmospheric and low‐pressure chemical‐vapor‐deposited silicon films , 1986 .
[3] T. F. Retajczyk,et al. Effect of phosphorus doping on stress in silicon and polycrystalline silicon , 1983 .
[4] T. Kamins. Design properties of polycrystalline silicon , 1990 .
[5] A. Maradudin,et al. Propagation of shear horizontal surface acoustic waves parallel to the grooves of a random grating , 1991 .
[6] R. Solanki,et al. A systematic study and optimization of parameters affecting grain size and surface roughness in excimer laser annealed polysilicon thin films , 1997 .
[7] Y. Nagae,et al. A 10-s doping technology for the application of low-temperature polysilicon TFTs to giant microelectronics , 1993 .
[8] M. Hack,et al. Grain growth in laser dehydrogenated and crystallized polycrystalline silicon for thin film transistors , 1994 .
[9] G. Stoney. The Tension of Metallic Films Deposited by Electrolysis , 1909 .
[10] Khalil Najafi,et al. Measurement of fracture stress, young's modulus, and intrinsic stress of heavily boron-doped silicon microstructures , 1989 .
[11] T. Kamins. Polycrystalline silicon for integrated circuit applications , 1988 .
[12] D. Maier-Schneider,et al. Elastic properties and microstructure of LPCVD polysilicon films , 1996 .
[13] Roger T. Howe,et al. Stress and Microstructure in Phosphorus Doped Polycrystalline Silicon , 1992 .
[14] S. Mccarthy,et al. The Effect of Temperature and Pressure on Residual Stress in LPCVD Polysilicon Films , 1992 .
[15] R. Howe,et al. Stress in polycrystalline and amorphous silicon thin films , 1983 .
[16] Roger T. Howe,et al. Stress in undoped LPCVD polycrystalline silicon , 1991, TRANSDUCERS '91: 1991 International Conference on Solid-State Sensors and Actuators. Digest of Technical Papers.
[17] T. Y. Huang,et al. Crystallization of Silicon Ion Implanted LPCVD Amorphous Silicon Films for High Performance Poly-TFT , 1990 .
[18] S. M. Hu,et al. Stress‐related problems in silicon technology , 1991 .