Characterization of epitaxial TiO2 films prepared by pulsed laser deposition

Abstract Epitaxial titanium dioxide thin films with anatase and rutile structures have been deposited by pulsed laser deposition (ArF excimer laser) under a controlled O 2 atmosphere. The anatase TiO 2 (0 0 1) films have been successfully prepared on LaAlO 3 (0 0 1), LSAT (0 0 1), SrTiO 3 (0 0 1) and YSZ (0 0 1) substrates. Also, high-quality epitaxial rutile TiO 2 (1 0 0) films were grown on α -Al 2 O 3 (0 0 0 1) substrates. The substrate temperature during the deposition was in the range from 349°C to 608°C under 6×10 −3  Torr O 2 gas pressure. The quality of films and crystallographic relationships were assessed by X-ray diffraction, X-ray pole figures and Rutherford backscattering spectroscopy (RBS)/channeling. The optical properties were characterized in the ultraviolet-visible region by optical absorption measurement. The optical band gaps for anatase and rutile TiO 2 epitaxial films were evaluated to be 3.22 and 3.11 eV, respectively.

[1]  Xiaohua Liu,et al.  Epitaxial growth of TiO2 thin films by pulsed laser deposition on GaAs(100) substrates , 2001 .

[2]  Alfonso Franciosi,et al.  Ultrahigh vacuum metalorganic chemical vapor deposition growth and in situ characterization of epitaxial TiO2 films , 1993 .

[3]  K. Kunimori,et al.  Epitaxial growth of titanium oxide thin films on MgO(100) single-crystal substrates by reactive deposition methods , 1997 .

[4]  Masayuki Kamei,et al.  Hydrophobic drawings on hydrophilic surfaces of single crystalline titanium dioxide : surface wettability control by mechanochemical treatment , 2000 .

[5]  Alexana Roshko,et al.  Heteroepitaxial growth of TiO2 films by ion-beam sputter deposition , 1996 .

[6]  Sugiharto,et al.  Preparation of TiO2-anatase film on Si(001) substrate with TiN and SrTiO3 as buffer layers , 2001 .

[7]  Travis J. Anderson,et al.  Solid precursor MOCVD of heteroepitaxial rutile phase TiO2 , 1996 .

[8]  Mark H. Engelhard,et al.  MOCVD growth and structure of Nb- and V-doped TiO2 films on sapphire , 2000 .

[9]  Qi Tang,et al.  Structural control of TiO2 film grown on MgO(001) substrate by Ar-ion beam sputtering , 1997 .

[10]  Gregory S. Herman,et al.  X-ray photoelectron diffraction study of an anatase thin film: TiO2(001) , 2000 .

[11]  J. Yates,et al.  Photocatalysis on TiO2 Surfaces: Principles, Mechanisms, and Selected Results , 1995 .

[12]  Characteristics of TiO2 coatings produced by the reactive ionized cluster beam method , 1992 .

[13]  Jianchang Guo,et al.  Structural properties of epitaxial TiO_2 films grown on sapphire (11$\overline 1$0) by MOCVD , 1992 .

[14]  M. Grätzel,et al.  Structure and stability of the anatase TiO2 (101) and (001) surfaces , 2000 .

[15]  F. Lévy,et al.  Growth and Raman spectroscopic characterization of TiO2 anatase single crystals , 1993 .