Etched characteristics of nanoscale TiO2 using C4F8-based and BCl3-based gases
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D. W. Kim | Hee Ju Kim | J. Hong | H. Tak | Yeon Hee Kim | Kideock Bae | G. Y. Yeom | Jeong Yub Lee | Hae Soo Bae | Soo Nam Goong | Seong Bae Kim
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D. W. Kim | Hee Ju Kim | J. Hong | H. Tak | Yeon Hee Kim | Kideock Bae | G. Y. Yeom | Jeong Yub Lee | Hae Soo Bae | Soo Nam Goong | Seong Bae Kim