论文信息 - In situ real time monitoring of nanosecond imprint process

In situ real time monitoring of nanosecond imprint process

Using a real time imprint monitoring system (RIMS), the authors measured the process time for laser assisted nanoimprint lithography to be about 200ns. They found that during this short period of time, the mold had been fully pressed into the resist, resulting in a full pattern transfer with high fidelity. Their results also demonstrated the capability of RIMS for monitoring an ultrafast imprint process.

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