Improved resolution with advanced negative DUV photoresist with 0.26N capability
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William R. Brunsvold | James W. Thackeray | Laura L. Kosbar | Jeffrey D. Gelorme | Gregory P. Prokopowicz | Jacque H. Georger | Eyad Ayyash | Ali Afzali-Kushaa
[1] Margaret C. Lawson,et al. Advanced negative resists using novel aminoplast crosslinkers , 1998, Advanced Lithography.
[2] James W. Thackeray,et al. Effect of resin molecular weight on the resolution of DUV negative photoresists , 1994, Advanced Lithography.
[3] Takanori Kudo,et al. Material design and lithographic performance of novel hydroxystyrene-copolymer-based DUV negative resists , 1998, Advanced Lithography.