The physics and phenomenology of One Atmosphere Uniform Glow Discharge Plasma (OAUGDP™) reactors for surface treatment applications

In this paper, we present data on the physics and phenomenology of plasma reactors based on the One Atmosphere Uniform Glow Discharge Plasma (OAUGDP™) that are useful in optimizing the conditions for plasma formation, uniformity and surface treatment applications. It is shown that the real (as opposed to reactive) power delivered to a reactor is divided between dielectric heating of the insulating material and power delivered to the plasma available for ionization and active species production. A relationship is given for the dielectric heating power input as a function of the frequency and voltage at which the OAUGDP™ discharge is operated.

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