Structural, Morphological, Vibrational and Optical Properties of GaN Films Grown by Reactive Sputtering: The Effect of RF Power at Low Working Pressure Limit
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M. Massi | W. Miyakawa | D. Leite | A. L. C. Pereira | A. S. Silva Sobrinho | C. Stegemann | R. S. D. Oliveira | H. A. Folli | I. M. Horta | B. S. Damasceno | B. Damasceno | I. Horta