The next generation microelectronics craft technique: Nanoimprint lithography

Transfer of graphics is achieved by optical lithography for several decades in semiconductor process. The production capacity of 45 nm node has been formed. But now semiconductor industry is difficult to be developed according to the Moore law because of the inherent limitations of optical lithography. Now electron-beam directwriting, X-ray exposure and nanoimprint technology are the main technologies for next generation graphics transfer technology. Nanoimprint technology has the advantages of high yield, lowcost and simple process. This paper introduced the traditional nanoimprint technology and its development, including the principle, applications and challenges.

[1]  Li Shi,et al.  Nanoimprint lithography based fabrication of shape-specific, enzymatically-triggered smart nanoparticles. , 2008, Journal of controlled release : official journal of the Controlled Release Society.

[2]  Evelyn Meyer,et al.  Patterning Polymers by Micro‐Fluid‐Contact Printing , 2001 .

[3]  S. Matsui,et al.  Three-dimensional nanoimprint using a mold made by focused-ion-beam chemical-vapor-deposition , 2002, 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers..

[4]  Edmond Cambril,et al.  Tri-layer systems for nanoimprint lithography with an improved process latitude , 2000 .

[5]  Jian Wang,et al.  Fabrication of a new broadband waveguide polarizer with a double-layer 190 nm period metal-gratings using nanoimprint lithography , 1999 .

[6]  Vincent Studer,et al.  Nanoimprint lithography for the fabrication of DNA electrophoresis chips , 2002 .

[7]  Stephen Y. Chou,et al.  Patterned magnetic nanostructures and quantized magnetic disks , 1997, Proc. IEEE.

[8]  Wilhelm T. S. Huck,et al.  Nanocontact Printing: A Route to Sub-50-nm-Scale Chemical and Biological Patterning , 2003 .

[9]  Rainer Waser,et al.  Nanoimprint for future non-volatile memory and logic devices , 2008 .

[10]  R. Friend,et al.  Formation of nanopatterned polymer blends in photovoltaic devices. , 2010, Nano letters.

[11]  Bo Cui,et al.  Large area high density quantized magnetic disks fabricated using nanoimprint lithography , 1998 .

[12]  William J. Dauksher,et al.  Advances in Step and Flash imprint lithography , 2003, SPIE Advanced Lithography.

[13]  Johannes Koeth,et al.  Quantum point contacts fabricated by nanoimprint lithography , 2000 .

[14]  Edmond Cambril,et al.  Nanoimprint lithography for a large area pattern replication , 1999 .

[15]  Bernard Choi,et al.  Step and flash imprint lithography: a new approach to high-resolution patterning , 1999, Advanced Lithography.

[16]  Todd C. Bailey,et al.  Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology , 2002 .

[17]  C. M. Sotomayor Torres,et al.  Nanoimprint lithography: challenges and prospects , 2001 .

[18]  X. Zhao,et al.  The structure, magnetostriction, and anisotropy compensation of (Tb1−xPrx)(Fe0.4Co0.6)1.9 alloys , 1997 .

[19]  William J. Dauksher,et al.  Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device , 2003, SPIE Advanced Lithography.

[20]  Zhaoning Yu,et al.  Nanoscale GaAs metal–semiconductor–metal photodetectors fabricated using nanoimprint lithography , 1999 .

[21]  Gun Young Jung,et al.  Fabrication of a 34 × 34 Crossbar Structure at 50 nm Half-pitch by UV-based Nanoimprint Lithography , 2004 .

[22]  S. Chou,et al.  Imprint Lithography with 25-Nanometer Resolution , 1996, Science.

[23]  Stephen Y. Chou,et al.  Imprint of sub-25 nm vias and trenches in polymers , 1995 .