SiO2 thin film preparation using dielectric barrier discharge-driven excimer lamps
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[1] Kou Kurosawa,et al. A single precursor photolitic chemical vapor deposition of silica film using a dielectric barier discharge xenon excimer lamp , 1996 .
[2] Y. Chuang,et al. Pulsed ultraviolet laser deposition of SiO2 films at 248 nm , 1995 .
[3] Ian W. Boyd,et al. DIRECT PHOTO-DEPOSITION OF SILICON DIOXIDE FILMS USING A XENON EXCIMER LAMP , 1993 .
[4] Ulrich Kogelschatz,et al. Modification of surfaces with new excimer UV sources , 1992 .
[5] Minoru Obara,et al. New high‐efficiency quasi‐continuous operation of a KrF(B→X) excimer lamp excited by microwave discharge , 1989 .
[6] R. Srinivasan,et al. Ablation of polymers and biological tissue by ultraviolet lasers. , 1986, Science.
[7] F. Bachmann,et al. ArF laser induced CVD of SiO2 films: a search for the best suitable precursors , 1992 .
[8] Ulrich Kogelschatz,et al. Silent-discharge driven excimer UV sources and their applications , 1992 .
[9] A. Klumpp,et al. Deposition of high quality SiO2 layers from TEOS by excimer laser , 1989 .