论文信息 - The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition

The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition

It has been successfully demonstrated that the scattered-light intensity of thermally grown particle clouds consisting of particles of less than 20 nm in size above wafers in a real tungsten (W) chemical vapor deposition (CVD) chamber correlate well with both the surface roughness of the W-CVD film measured by atomic force microscopy and with the gas-flow ratio SiH4/WF6. In addition, we can observe the appearance and motion of particle clouds corresponding to the transient variation of the ratio SiH4/WF6 at the conversion of gases and at the change of the flow ratio. These features of our in situ particle monitor enable us to achieve the mass-production conditions for particle-free and smooth surfaces of W films with short cycle time. Moreover, our particle monitor is sensitive enough to adopt in the development of process conditions as the reduction of design rules for large-scale integrated circuit proceeds. Therefore, applying our in situ particle monitor above wafers for developing mass-production con...

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