Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
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Se Stephen Potts | Wilhelmus M. M. Kessels | G. Dingemans | W. Kessels | C. Lachaud | G Gijs Dingemans | Christophe Lachaud | S. Potts
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